Used AIXTRON LYNX-iXP #293804468 for sale

AIXTRON LYNX-iXP is a state-of-the-art deposition tool based on the industry leading AIXTRON Close Coupled Showerhead (CCS) technology. It has a unique architecture consisting of plates within the reaction chamber and a plasma source attached to the exterior of the chamber. The design minimizes gas transit time and surface reaction on the reactor walls, which helps to maximize the throughput. This technology allows for a more uniform and stable plasma, increasing material deposition rates. LYNX-iXP uses a variety of gas chemistries and device configurations to interact with the surrounding CCS plates. It is capable of ultra-high vacuum operation with a base pressure of less than 1.0E-7 Torr. This lets the reactor to handle a wide range of materials with exceptional levels of precision and accuracy. The deposition process is controlled using an advanced computer system and a wide range of unique applications available through the tool interface. For example, the "SOLATE" application provides very low energy deposition for developing epitaxial layers for semiconductor devices. AIXTRON LYNX-iXP is well suited for research applications, and is used for developing high quality thin films for a variety of applications. It has been specifically designed for processing low-k dielectrics and other materials for which the CCS technology is well-suited. This includes materials such as oxides, nitrides and fluorides. LYNX-iXP also offers superior substrate temperatures with a maximum temperature of over 500 °C. This enables the deposition of high quality materials such as diamond-like carbon, which has been demonstrated to be successful on AIXTRON LYNX-iXP. The heating and cooling systems are integrated into the chamber design to ensure that uniform and repeatable requirements can be achieved. LYNX-iXP is able to provide high quality deposition results, with a wide range of materials and applications available. The highly optimized gas dynamics and the vast range of control parameters provide a versatile, robust solution for deposition processes. With AIXTRON CCS technology, AIXTRON LYNX-iXP can achieve unprecedented levels of precision and uniformity in thin film deposition.