Used AIXTRON LYNX-iXP #9098086 for sale

AIXTRON LYNX-iXP is a unique reactor designed specifically for deposition of semi-conductive materials such as silicon, gallium arsenide, and indium phosphide, among others. The reactor has a unique structure with a single wafer adjustable process tube, which allows for different layers to be deposited in a single deposition operation. Additionally, the chamber can support different substrate sizes on different substrates, including silicon substrates, gallium arsenide, and indium phosphide, as well as non-conductive compound substrates. The reactor is designed to provide the highest level of process stability and the most reliable process control for an industrial volatile and hygroscopic deposition process. This is achieved through the use of advanced robotics and a microcomputer equipment for process automation and communication; a two-level heating system; a modular control unit; quick-response scanners; and an advanced vacuum machine. A chamber pressure of 0.5 Torr is achievable with LYNX-iXP, which allows for high deposition rates while maintaining uniformity across the substrate. The chamber is also equipped with an integrated thermal imaging tool that provides real-time information on the quality of layers being deposited. This real-time feedback enables faster process optimization and the ability to predict the outcome of deposition runs more accurately. AIXTRON LYNX-iXP can accommodate substrates up to 6-in x 4-in and can be used with a variety of wafer carriers. The reactor also has a built-in superior uniformity uniformity (SUU) module for layer thickness uniformity and is compatible with a range of high-temperature processes. LYNX-iXP has long-term reliability and an excellent record in long operation and wafer throughput. The integrated modular controller (IMC) allows users to control the process parameters during wafer deposition, as well as the ability to access the asset's operating history and performance. It is easy to operate, as well as being very reliable. Overall, AIXTRON LYNX-iXP provides a precise, reliable deposition process for a wide range of applications and substrates. The reactor is extremely versatile, allowing for deposition of a variety of materials, as well as precise control and monitoring of the deposition process. Its long-term reliability and operating history make the reactor an excellent choice for a variety of semi-conductive materials deposition applications.