Used AIXTRON LYNX-iXP #9098087 for sale

AIXTRON LYNX-iXP is a state-of-the-art Low Pressure Chemical Vapor Deposition (LPCVD) reactor designed to meet the highest requirements of the semiconductor and MEMS industry. This innovative technology provides for precise, repeatable creation of thin film coatings or substrates in even the most challenging processes. LYNX-iXP is capable of handling large batch and single substrate processes without compromising performance or reliability. AIXTRON LYNX-iXP reactor offers unparalleled performance in terms of uniformity, stability, and reliability, all without compromising on cost. LYNX-iXP is a flexible PVD system that can be used for many applications, from cutting-edge research to mature production. It features a ceramic coated quartz tube, providing a mild and uniform substrate temperature while using an argon-nitrogen based process gas. AIXTRON LYNX-iXP also features an adjustable deposition zone length for fine-tuning film composition. The reactor has control systems that provide a range of recipe options, including easy-to-implement and cycle-time optimized recipes. This makes it easy to quickly switch from one process to another. LYNX-iXP also comes with an integrated source chamber that helps reduce metal contamination over long process cycles. In addition to its robust design and optional source chamber, AIXTRON LYNX-iXP provides a platform for developers to customize processes and materials for their own development. The reactor can be equipped with features such as remote plasma, substrate cleaning, and post-process cooling. This allows developers to experiment with different materials, process recipes, and techniques that may lead to further developments in micro- and nano-electronics fabrication. LYNX-iXP is an efficient, reliable and cost-effective LPCVD reactor for micro- and nano-electronic device production. This innovative reactor offers capability not found in other systems, including process development, fine-tuned recipes, and high-quality, uniform thin films. With its broad range of process options and customizable features, AIXTRON LYNX-iXP is an ideal choice for demanding applications.