Used AIXTRON LYNX2 #9130267 for sale

AIXTRON LYNX2 is a state-of-the-art semiconductor manufacturing reactor designed for deposition of high-quality thin film materials for a wide variety of technological applications. It is an all-in-one reactor that combines plasma enhanced chemical vapor deposition (PECVD) techniques with high-efficiency and low-cost vacuum deposition. LYNX2 is capable of deposition on large area substrates such as panels, wafers, or even flexible materials. AIXTRON LYNX2's high-performance deposition process is achieved through its automated process control, precision high-level heating abilities, consistent process control at all temperatures, and maintained film uniformity. The process is enabled by optional load lock capabilities, allowing short or long deposition runs with minimum operations. The automated control software allows the user to modify the deposition process parameters in response to changes in process requirements or material type with minimal or no further manual intervention. LYNX2's design includes an optimized electrostatics and magnetic field inside the reactor chamber that minimizes flaking and destruction, ensuring uniformity and high-quality deposition rates. AIXTRON LYNX2 is capable of high throughput, meaning that short deposition times are possible for larger areas. This enables increased productivity, reliability, and repeatability, resulting in greater satisfaction for productivity-minded customers. LYNX2's integrated process monitoring and feedback systems provide valuable insights into the quality and consistency of the deposition process. The process control features allow for easy adjustment of the process parameters to ensure that all materials are deposited in satisfactory thickness and quality. AIXTRON control technologies prevent any over- or under-deposited material layers. AIXTRON automated fault diagnostics and reporting system allows individual modules to be easily replaced, therefore increasing the mean time between failures (MTBF) and further enhancing the reliability and performance of AIXTRON LYNX2. The maintenance alert system indicates any process failure or hardware malfunction, and the flexible software architecture allows automated note-taking and process adjustments to be made immediately and efficiently. LYNX2 is a state-of-the-art reactor providing a range of high quality, cost-effective deposition techniques for a variety of industries. Its automated control system ensures high throughput, minimal maintenance requirements, and repeatable film deposition results. Its advanced electrostatics and magnetic field ensures high uniformity and film quality. Its process monitoring and feedback systems provide valuable insights into deposition process and makes it possible to make changes quickly, if necessary. Its high performance, automated processes, and low cost ensure that AIXTRON LYNX2 is the desired choice for semiconductor manufacturing.