Used AIXTRON LYNX3 #9159015 for sale

AIXTRON LYNX3 is a plasma-enhanced chemical vapor deposition (PECVD) reactor used for advanced deposition of thin films. LYNX3 combines advanced technology such as linear multi beam engineering, optical diagnostics, and patented cylindrical inductive RF heating with reliable equipment design, making it the ideal tool for the deposition of thin-films and nanostructures. Equipped with several hardware and software components, AIXTRON LYNX3 system provides a comprehensive range of capabilities to produce high-quality thin films and nanostructures. The deposition unit utilizes three linear multi beam engineering sources, an optical detection machine, inductive RF heating, and two injectors to assist with the deposition process. The linear multi beam engineering sources are designed to allow for precise control of the ionization level in the reactor chamber while allowing the growth of high-quality thin films and nanostructures. Additionally, the optical detection tool has a high temporal resolution and can detect a wide range of emission signals during the deposition process. LYNX3 also features an inductive RF heating asset specifically designed for the production and deposition of thin-films. This model uses a two-sided cylindrical inductive heating element with a low-inductance, efficient, and durable design for consistent and highly controlled RF power delivery. The RF heating element on AIXTRON LYNX3 is adjustable and can be independently coupled with the linear multi beam engineering sources for maximum process flexibility. LYNX3 also features two injection ports to facilitate the deposition of nanostructures and to make optimal use of existing materials. This allows for higher dopant levels and higher growth rates with greater process flexibility. Additionally, as with all AIXTRON systems, AIXTRON LYNX3 is fully compatible with a variety of different deposition materials and can be used for a wide range of applications. Overall, LYNX3 is a versatile and reliable equipment for the production and deposition of thin-films and nanostructures. The advanced linear multi beam engineering, optical diagnostics, and inductive RF heating capabilities make AIXTRON LYNX3 an ideal tool for both experienced and novice users. Additionally, the two injection ports and adjustable RF heating element further increase its flexibility, allowing users to produce thin films and nanostructures with superior quality and efficiency.