Used AIXTRON LYNX3 #9206615 for sale

AIXTRON LYNX3 is an advanced chemical vapour deposition (CVD) reactor designed for deposition of thin films in microelectronics and optoelectronic applications such as solar cells, micro-LEDs, flexible displays and semiconductor memory devices. It offers excellent uniformity and superior sidewall coverage, as well as superior step coverage for complex structures. LYNX3 utilizes a Cold Wall reactor technology, which significantly reduces temperature variation in the deposition chamber. This technology eliminates undesired temperature fluctuations and ensures consistent results. AIXTRON LYNX3 reactor is equipped with a three necked vertical showerhead designed for deposition of films with uniform thickness over large areas. It is available in a variety of chamber sizes from 8-inch to 24-inch and offers both high-volume production capabilities and medium-volume research and development capabilities. The reactor is also equipped with advanced safety features and multiple process control capabilities, making it ideal for both commercial and research applications. LYNX3 is equipped with a Multi-Gas Injection System (MGIS) that allow users to accurately control reactant flow rates for optimum process control. In addition, the reactor is equipped with convergent-divergent nozzles (CDN's) that enable uniformity of film across flat wafers as well as on the sidewalls of objects such as MEMS and advanced dielectric layers. The system also supports Front Wall Injection (FWI), a feature designed to enable copper deposition on metalized metallization layers. AIXTRON LYNX3 reactor features advanced power and temperature control systems that allow users to accurately and precisely control process parameters, as well as monitoring the deposition process in real-time. Optical sample viewing allows the user to assess the quality of the deposition films. The reactor also supports a process monitoring software package, which enables users to quickly identify and troubleshoot process problems. In conclusion, LYNX3 is an advanced CVD reactor designed to meet demanding requirements and applications in the microelectronics and optoelectronic industries. It is equipped with advanced features such as the Multi-Gas Injection System (MGIS) and Front Wall Injection (FWI) that enable uniformity of film across flat wafers as well as on the sidewalls of objects. The reactor also features advanced process control and monitoring capabilities, making it an ideal choice for production as well as research and development purposes.