Used AIXTRON Tricent #9199207 for sale

AIXTRON Tricent is an atmospheric-pressure Chemical Vapor Deposition (AP-CVD) reactor developed by AIXTRON. This tool is designed to provide users with a reliable, high-performance platform for nanomaterials and thin film deposition. Unlike other CVD systems, Tricent features an advanced in-line design that makes it easy to integrate with additional processes or equipment. The equipment features three main components—the cold mount, the hot mount, and the nozzle—which are designed to offer a wide range of process capabilities and uniformity. The cold mount of AIXTRON Tricent is a robust and reliable three-zone heater system that ensures uniform temperature distribution over the entire substrate. In addition, the cold mount also features advanced gas control and purge mechanisms, which help achieve superior both temperature control and process stability. The hot mount of Tricent features an advanced arc-plug design, which allows users to deposit materials with the highest possible aspect ratio. Furthermore, the hot mount has an optimized gas supply unit, which ensures the optimal gas flow rate throughout the processing cycle. This machine is designed to provide a homogenous structure and perfect adhesion of deposited layers. To ensure uniform thin-film deposition, AIXTRON Tricent is equipped with a highly precise nozzle. This nozzle is designed for long-term operation and ensures a stable and reproducible material emission. Furthermore, the nozzle is capable of producing droplets of a precise size and a defined velocity, which helps ensure uniform film deposition on the substrate. Overall, Tricent is an incredibly powerful and versatile platform for depositing nanomaterials and thin films. It is capable of producing uniformly thick and high-quality layers with excellent adhesion and precision. Furthermore, its advanced in-line design makes it easy to integrate with additional processes and equipment.