Used AIXTRON TS 19x2" #9386610 for sale

AIXTRON TS 19x2 is a high-temperature chemical vapor deposition (CVD) equipment that is used for the production of different types of materials, such as films or coatings in the semiconductor industry. This system is equipped with a hot wall tubular reactor, featuring a cooled substrate holder and four heated gas injectors with adjustable temperature settings. AIXTRON TS 19x2 is a reliable and efficient unit that allows for precise control of the environment where materials are produced. It offers up to 18 independently adjustable temperature zones, making it possible to create homogenous temperature distribution within the reactor and get more precise results. AIXTRON TS 19x2 also includes a fully enclosed process chamber that can be pressure-tightened up to 10-3 torr. This helps to limit the amount of process gases that escape during the deposition of materials. AIXTRON TS 19x2 has an adjustable rotation speed capable of producing a high-quality, uniform and homogeneous film layer. It also has a high throughput while using less energy, which makes it a less costly alternative to traditional CVD systems. Additionally, this machine can be customized to accommodate different sizes of substrates, making it suitable for a variety of applications. AIXTRON TS 19x2 is a versatile tool that can be used for a variety of processes, such as diamond-like carbon deposition, multi-layer coatings, and thin-film deposition. It offers precise control of process conditions and uniform deposition by using uniform precursor gas distribution, making it suitable for various industrial applications. Overall, AIXTRON TS 19x2 is a reliable CVD asset that is suitable for a variety of processes. It offers a high throughput, adjustable temperature settings, and a pressure-tight process chamber, making it an efficient model for a range of applications.