Used AIXTRON TS CCSH19*2" #9167079 for sale

AIXTRON TS CCSH19*2 is a high temperature chemical vapor deposition (CVD) reactor for the production of quality thin-film deposits and epitaxial layers. It is mainly used for the growth of compound semiconductor materials and includes an innovative feature: a vertically adjustable substrate geometry. This allows for a greater range of growth geometries than other CVD reactors, and can also accommodate substrate sizes up to two inches in diameter. The main chamber of AIXTRON TS CCSH19*2 is body consists of stainless steel components and is designed to optimize process yield. It incorporates a double-walled electron beam welded transition chamber and a molybdenum boat for the source material, ensuring that no particles from the coating process are released outside the main chamber. The main chamber is also designed to provide protection against back-reflection from the target material. The chamber also features a temperature control for the substrate up to an effective range of +2000C, and pyrometer feedback for increased process consistency. AIXTRON TS CCSH19*2 reactor also features a patented source shutter protection system, which keeps the source material in protective contact with the substrate even during reactive deposition events. This helps to ensure consistency across the deposition process, and protects the source material from premature oxidation or deactivation. AIXTRON TS CCSH19*2 reactor is equipped with inlet and outlet ports, including gas lines, vacuum lines, and mass flow controllers. This allows for precise control of source gases and possible dopants, and the mass flow controllers provide complete control over the deposition rate. AIXTRON TS CCSH19*2 also includes a programmable process controller, which allows for precise control of deposition temperature, pressure, and flow rates. These features ensure precise control of the deposition process and consistent and repeatable results. In addition, AIXTRON TS CCSH19*2 reactor includes a range of built-in safety features, which include a pressure sensor, a temperature sensor, and a process end-stop timer. This ensures that operation remains safe and consistent, even during the longest processes. All controls are incorporated in the system for easy monitoring and optimization of the process. AIXTRON TS CCSH19*2 reactor is a reliable, easy to use, and efficient CVD reactor for quality thin-film deposition. It offers a broad range of substrate sizes and geometries, and allows for the precise control of deposition parameters. It also has a variety of safety features to ensure safe and consistent operation. All of these features make it an ideal choice for the production of high quality thin-film layers and epitaxial structures.