Used AIXTRON TS CCSH30x2" #9386936 for sale

AIXTRON TS CCSH30x2 is a commonly used batch reactor, ideal for the deposition of thin films. It is capable of depositing layers with different thicknesses, with excellent uniformity and controlled profile shape. This reactor is also suitable for various applications, ranging from sputter deposition to ALD (Atomic layer deposition). The design of the reactor includes a single-source RF magnetron source, an anti-reflection (AR) substrate holder, and a multi-cathode. The chamber temperature can be independently regulated for each wafer in a range from room temperature to over 500°C. The process temperature can be accurately controlled through the RF source and covers a wide range of arbitrary operating points. The concentration of the magnetic field inside the chamber allows for deposition of heterostructures even at low temperatures. The wafer holder is designed for both planar and wire-based substrates, and the source's height can be adjusted to accommodate different substrate holders. The reactor is also equipped with an automated pre-configuration system that, upon user-defined parameters, is able to set process conditions, including pressure, temperature, bias, and turbomolecular pump speed. AIXTRON TS CCSH30x2 is a reliable and efficient batch reactor capable of depositing layers of various thickness. Its design allows for excellent uniformity and a controlled profile shape, with flexible process conditions and wide temperature range. The reactor is equipped with an automated pre-configuration system for quick and easy setup of process parameters, and the single-source RF magnetron source offers maximum flexibility for deposition of heterostructures. Overall, AIXTRON TS CCSH30x2 is an ideal choice for a variety of applications, from sputter deposition to ALD.