Used AIXTRON TS CCSH55x2" #9386947 for sale

AIXTRON TS CCSH55x2 is a state-of-the-art Chemical Vapor Deposition (CVD) reactor used for the manufacturing of thin film coatings and devices. It is a 200 mm wide by 85 mm long slot-type reactor intended for the production of nanometer thick devices, including an integrated heating element. The equipment operates by processing a single semiconducting material at a time, under controlled temperature and atmospheric pressure, in either a single phase or as a series of multiple phases. The main components of AIXTRON TS CCSH55x2 are the processing chamber, the CVD reactor head, and the gas delivery system. The processing chamber is a sealed enclosure made from stainless steel, creating a uniform temperature environment and preventing air contamination. The CVD reactor head contains heating elements, that are used to heat the wafer and evenly warm the reactants. It also houses a quartz window, allowing infrared radiation to enter the processing chamber, while still protecting the semiconducting material from dust and harmful UV radiation. The gas delivery unit is responsible for delivering the reactants to the processing chamber in precisely controlled amounts and at precisely controlled speeds. AIXTRON TS CCSH55x2 has several safety features built in to ensure the user's safety. The machine includes a combination of pressure and temperature safety valves, limiting the temperature and pressure increase, as well as emergency shutoff buttons in case of a tool or chamber failure. The reactor also has a vacuum insulation layer surrounding the processing chamber, which minimizes the possibility of any hazardous material entering the working environment. AIXTRON TS CCSH55x2 also boasts a wide range of advanced features. This includes the use of a graphical user interface, which allows for direct reading and communication between the user and the CVD reactor. This helps to prevent errors by providing real time feedback on the asset's settings. The CVD reactor also features multiple, adjustable parameters, allowing users to the flexibility and precision necessary for the production of high quality thin film coatings. AIXTRON TS CCSH55x2 is ideal for a range of applications, including semiconductor deposition, coating thin films, monolithic integration, and creating semiconductor device components. The reactor offers the latest technology and superior performance, making it a reliable tool for the production of materials with precise, uniform layers, on a range of substrate sizes.