Used AIXTRON TS OCSH 31X2 #9181636 for sale

AIXTRON TS OCSH 31X2 is a high precision chemical vapor deposition reactor that is used in the manufacture of compound semiconductors such as Gallium Arsenide (GaAs). The machine consists of a number of components, including a process chamber, showerheated susceptors, a crucible, a pressure controller, a gas control equipment, and a low-pressure RF source. The process chamber is a sealed metal enclosure that contains the reactants and the substrate. The chamber is designed to maintain a vacuum and to ensure that the reactants are evenly distributed. Inside the chamber, the reactants are heated to temperatures of up to 1000°C, with the susceptors providing the necessary heat. The crucible within the chamber holds the reactants and is heated by the shower-heated susceptors. The gas control system injects precise amounts of reactant gases through the nozzle into the chamber to provide the required chemical reactions. The low-pressure RF source is used to excite the reactants and generate uniform coatings on the substrate. The pressure controller is used to regulate the pressure within the chamber to ensure that the reactants are evenly distributed and to prevent premature reaction. The chamber maintained temperatures and controlled pressure allows for precise and repeatable processes with minimal process variations. As a result, TS OCSH 31X2 is capable of producing high quality, repeatable, and cost effective devices. Additionally, AIXTRON TS OCSH 31X2 is equipped with various safety features. It includes an automatic shutter unit that prevents UV light from entering the machine during the reactive process, in addition to an emergency stop tool that halts the entire process if something goes wrong. It also has various sensors that are used to monitor the temperature, pressure, and reactant gases within the chamber, providing an additional layer of safety and precision. TS OCSH 31X2 is an advanced tool for producing compound semiconductors. With its powerful combination of heat and pressure sources, precise gas controls, and automated safety features, it can provide uniform and repeatable results with minimum process variations. It is an invaluable tool for the production of GaAs devices such as LEDs, lasers, and solar cells.