Used AIXTRON TS #9363430 for sale

AIXTRON TS is a state of the art commercial CVD reactor equipment for the deposition of thin films. It is developed by AIXTRON GmbH, and it is used to deposit semiconductor-grade thin films. TS is a modular system that can be customized according to the customer's requirements. It is mainly used for the deposition of dielectric, semiconductor or metallic materials onto substrates. AIXTRON TS reactor offers a number of advantages: It provides excellent uniformity of film thicknesses; it is easy to use, and easy to customize for different chamber configurations; it is available with an optional low temperature process chamber. TS also can be upgraded and retrofitted with new additions such as automation components, etc. The heart of AIXTRON TS is its proprietary Showerhead design. This design ensures uniform, high deposition rate and reproducible processes. The Showerhead can be set to different source pressures and the source material can be selected, modified and re-calibrated according to customer needs. This Showerhead allows a good uniformity in the flow of the gas, and also provides uniformity concerning temperatures, background pressure, and chamber temperature and allows consistent, stable processes. TS is equipped with a process computer, which can be used to fine-tune the process parameters including substrate temperature, chamber pressure and source gas input. This process computer includes dedicated process software, which helps the user to customize and adjust the process parameters. The process software also includes an auto-calibration feature that allows for automatic correction of process drifts and sources. AIXTRON TS also has excellent safety features: An emergency gas shut-off unit with an overpressure protection are installed to prevent any accidental damage to the thin films. An additional alarm machine sounds an audible warning in case of emergency. To sum it up, TS is a modular, reliable and customizable CVD reactor tool designed for the deposition of thin films. Its features and high-end process components make it an excellent tool for various CVD processes.