Used AIXTRON VP 2400HW #9269833 for sale

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Manufacturer
AIXTRON
Model
VP 2400HW
ID: 9269833
Wafer Size: 3"
Vintage: 2012
SiC Reactor, 3" Type: Modular CVD system Gas handling: Electro polished (316) stainless steels tubing Reactor: Electronic mass flow and pressure controllers Heater: RF-lnduction heater 2x80 kW, 20-50 kHz Maximum reactor temperature: 1600°C MO Temperature control: Recirculating controlled temperature baths Accuracy: 0.05°C Range: -10°C to +60°C Mass flow control: Electronic mass flow controllers (HiTec) Pressure control: MKS Baratron and valves Back pressure controllers: HiTec Power consumption: 22 kVA (Max) Vacuum system: EBARA ESA70WD Dry pump Pressure sensor Throttle valve Pressure control Vacuum valve Cooling water system: Digital flaw meters with data logging Thermocouples for cooling water temperature monitoring 2012 vintage.
AIXTRON VP 2400HW is a reactor specifically designed for the production of compound and metal-organic semiconductor materials. It is based on a horizontal susceptor design and is capable of processing 2" to 8" wafers. The reactor environment is controlled by a closed loop computer control system which makes monitoring, measuring and adjusting the parameters of the process easy. The reactor is composed of an Anderson pump, a reaction chamber, and the heat sink. The Anderson pump helps create the high vacuum necessary for the process, while the reaction chamber contains the source materials which are evaporated, and the heat sink cools the chamber. The chamber also contains three heating zones: the susceptor, side walls, and bottom of the chamber which can be independently adjusted to accurately achieve desired temperatures. The reactor operates using the principles of the direct current (DC) magnetron sputtering technique. This method uses a dynamic electric field to accelerate charged particles (ions) towards a target material. By atomizing these target materials, AIXTRON VP 2400 HW is capable of producing extremely strong adhesion between materials and produces material films with precise uniformity. The reactor has several features which ensure precision control of the parameters of the process. The five step time-temperature program allows direct control of the reaction temperature and rate. This feature is combined with a computerized recipe and repeatable process to ensure the safety and consistency of the work. VP 2400HW is equipped with a suite of safety features to help protect operators from accidental exposure to the hazardous materials used in the reaction. Safety features include the safety interlock system, which shuts the system down in case of emergencies, as well as safety shutters which help prevent accidental opening of the reactor door during operation. VP 2400 HW is a reliable and efficient reactor for the production of compound and metal-organic semiconductor materials. With its computer controlled environment, precise control of temperatures, and safety features, it makes processing materials safe, cost-effective and repeatable.
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