Used AIXTRON XL #9363431 for sale

AIXTRON XL
Manufacturer
AIXTRON
Model
XL
ID: 9363431
System.
AIXTRON XL is a high-temperature metalorganic chemical vapor deposition (MOCVD) reactor designed and manufactured by AIXTRON. It is used in research and development as well as for high-volume production for thin-film technological applications such as optical windows, LED components, and solar cells. XL features a customized linear source optimization equipment (LSOS), which consists of a patented three-zone electron beam-induced thermal processing (EB-TP) technology, a gas delivery system, and a process control unit. The LSOS offers precise temperature control over the entire width of the target area, and its patented three-zone EB-TP technology provides high uniformity of temperature across the growth substrate's substrate area. The machine also includes a high-precision rotary deposition chamber, which allows up to five different depositions in one cycle to be executed. This enables HI-VI P-doping, low temperature doping, and low temperature deposition to be carried out all inside AIXTRON XL. Its wet processing feature enables the automation of etching, cleaning, and drying steps in one single process step and its precision mask alignment technology ensures maximum uniformity on the substrate. XL consists of a robust design that offers enhanced safety, quality, and reliability for use in industrial settings. It includes a built-in protective rate monitor and database that monitors and records all critical process data for quality assurance. Other features include a visualization tool with sequences and process parameter set-up that are easily checked from a graphical user interface. AIXTRON XL is an ideal choice for high-volume production of thin-film materials, thus considers an attractive and cost-effective solution in industrial settings. It is able to deliver accurate, reproducible, and repeatable results and it also enables fast change-over from one fabrication process to another. The asset also features a number of advanced process control functions and device monitoring capabilities. All of these features make it a very versatile reactor for use in various applications.
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