Used AMAT / APPLIED MATERIALS 0010-00745 #293654975 for sale

AMAT / APPLIED MATERIALS 0010-00745 is a semiconductor reactor designed for rapid, high throughput production of microelectronic devices. It is capable of accelerating diffusion processes and annealing with laser beam heating. The reactor is made up of several main components: a large, water-cooled nozzle assembly on a turntable, a quartz reactor chamber, a stationary substrate holder, an RF generator, a positioning and drive mechanism, and a control enclosure. The nozzle assembly is the most important part of AMAT 0010-00745 reactor and contains a water-cooled core surrounded by a stationary nozzle sleeve. The core has an indium-based liner, two or four flotation rings, an exhaust port and an inlet port. It is used to direct the laser beam to the substrate in the reactor chamber. The quartz reactor chamber is a heated, vacuum-sealed chamber that houses the substrate holder and holds the laser beam target. The substrate holder is made of a copper plate with a heating element. The plate holds the wafer while it is being processed within the chamber. An RF generator is used to create a high-frequency field within the reactor to regulate the heating of the substrate. The positioning and drive mechanism is responsible for accurately positioning the substrate and nozzle within the chamber. The control enclosure houses the reactor's control module, which monitors the operation of the different components and adjusts the process parameters accordingly. APPLIED MATERIALS 0010-00745 reactor is designed for highly efficient diffusion processes and annealing. Its water-cooled nozzle allows for an homogeneous laser beam power distribution over the substrate, hence resulting in high-quality electronic devices and reduced process time. Furthermore, the RF generator increases the uniformity of the temperatures within the reactor chamber, allows for an accurate control of the process and eliminates the need for long annealing times. Additionally, the positioning and drive mechanism is able to accurately position and move substrates in the chamber, making it suitable for a wide range of substrates. Finally, the control module ensures a consistent and optimized process by monitoring the different components. Overall, 0010-00745 reactor is an advanced and efficient semiconductor tool which can be employed for the production of microelectronic devices. By leveraging its advanced features, such as accurate substrate positioning, increased uniformity of temperatures, homogeneous laser beam distribution and high throughput, manufacturers can produce high-quality devices.