Used AMAT / APPLIED MATERIALS 0010-00957 #293668144 for sale
URL successfully copied!
Tap to zoom
AMAT AMAT / APPLIED MATERIALS 0010-00957 reactor is a highly advanced equipment used for thermal processing in semiconductor engineering. This reactor is of single-stage, direct-drive design, being able to precisely control the temperature and pressure of the process. The reactor has an exit chamber which is heated by two primary heating elements, consisting of radiation shields and resistive heating, on the sidewalls and an electrode assembly in the chamber's center. The primary heating elements are equally distributed in space in order to optimize efficiency. The reaction chamber, also known as the hearth, is sized to match the intended application. It features ceramic insulation as well as thermally-conductive liners for enhanced reaction uniformity. The chamber also includes an integrated heater mount designed to support the heating elements while maintaining the appropriate temperature. Additionally, it has an exit channel that serves to point the gas effluent away from the heating elements as well as providing a safe exit for product. The performance of the reactor is calibrated using APPLIED MATERIALS proprietary power control technology, which is specifically designed to keep a consistent temperature profile across the entire reaction chamber. This allows precise temperature regulation within specified target temperature tolerances. The power control system also enables the use of multiple independent power sources and provides the ability to tailor processes according to specific system requirements. The reactor is engineered with advanced safety features, including emergency shut-down systems and gas sensors. It is designed to be used in environments with full access to process gases, as well as oxygen levels that may be required in some processes. The reactor is also fitted with robust safety mechanisms, making it suitable for use in hazardous atmospheres. Overall, AMAT 0010-00957 reactor is a highly efficient and reliable piece of thermal processing equipment. It is designed to provide precise reaction temperature and pressure control, while still allowing for flexibility and adaptability to ensure successful results for a variety of applications. The safety features and high performance offered by this reactor make it an ideal choice for semiconductor processing.
There are no reviews yet