Used AMAT / APPLIED MATERIALS 0010-01286 #293663303 for sale

AMAT / APPLIED MATERIALS 0010-01286
ID: 293663303
MCA E-Chuck.
AMAT / APPLIED MATERIALS 0010-01286 reactor is a high vacuum chemical vapor deposition (CVD) reactor. This type of reactor is used in the semiconductor industry to produce crystals for micro-electronic devices, such as transistors, integrated circuits, and other components of electronic systems. The reactor works by depositing a thin film of the desired element over a surface of a product. The process is often used to create a coating of oxide, nitride, or other materials coating the product. AMAT 0010-01286 reactor is designed for use with high temperatures for deposition of thin film metal layers at temperatures up to 1200°C. The reactor features a wet-chemistry reaction chamber and a microwave plasma source for efficient deposition of thin films. The plasma source ensures high yields and repeatable deposition profiles for the product. The chamber is pressure-controlled through a vacuum equipment, and process monitoring is done through a temperature control system. The reactor contains a process gas inlet to the reaction chamber, and a process exhaust unit. The gas inlet is used to introduce the precursor gases, for example, silane gas for coating of silicon, and to introduce the carriers necessary for the process, such as oxygen and hydrogen. The process exhaust machine removes the product of reaction, such as unreacted molecules, or water from the reaction chamber and prevents the reaction chamber from overheating. APPLIED MATERIALS 0010-01286 reactor also features an interlocking feature which can stop the reaction process if any reaction conditions become abnormal. This ensures optimal thermal stability throughout the process. Furthermore, the reactor is constructed of durable stainless steel and is designed for easy operation with a digital control panel. 0010-01286 reactor is an ideal choice for deposition of thin films in the high-tech industry. This reactor provides a reliable, repeatable process for thin film deposition with high yields. The reactor is constructed of high-quality materials and provides precise control of temperature and gas conditions for optimal reaction processes. The interlock safety tool ensures optimal performance and safety of the user and device.
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