Used AMAT / APPLIED MATERIALS 0010-01286 #9043519 for sale

AMAT / APPLIED MATERIALS 0010-01286 reactor is an advanced and reliable in-line CVD (chemical vapor deposition) process device. It is designed for high volume production of opto-electronic devices such as semiconductors, optical devices, flat panel displays, and other related products. The reactor utilizes a quartz-lined reaction chamber which is heated by RF (radio-frequency) induction. This chamber also contains a gas inlet, an effluent outlet, a substrate holder, and a wafer loader / unloader. The reactor is capable of depositing thin films of various materials, such as aluminum, titanium, copper, silicon, etc., onto substrates. It can also deposit oxide, nitride, and hydrogen passivated films, as well as dopants like boron, phosphorous, arsenic, and gallium. The reactor is capable of operating at temperatures of up to 1100°C, depending on the materials being deposited, while maintaining a high level of uniformity. AMAT 0010-01286 features remote wafer loading and unloading into a substrate holder, as well as on-board monitoring and control. This ensures accuracy and repeatability of the deposition process. The reactor utilizes a high precision air pressure valve, allowing for aggressive process flow with pulse flow control of multiple gases. This provides a high degree of deposit homogeneity, with partial charges at high temperatures maintained on the target substrate. Using sixteen process gases and high-efficiency flow controls, APPLIED MATERIALS 0010-01286 is able to achieve flexibility and soft production cycle curve transitions, allowing for rapid production rate changes. Its automated touchscreen user interface is set up to facilitate quick setup and maintenance, as well as easy operation and monitoring of the reactor's operations. High safety standards are maintained on 0010-01286, with redundant safety alarms, as well as emergency shutdowns, preventing any dangerous situations. Its high performance and reliability, combined with its user-friendly interface, makes it an ideal choice for applications requiring process repeatability, uniformity, and overall efficiency.