Used AMAT / APPLIED MATERIALS 0010-03254 #293596912 for sale

AMAT / APPLIED MATERIALS 0010-03254 Reactor is a general purpose etch reactor designed for plasma-enhanced chemical vapor deposition (PECVD). It is designed for use in medium to large-scale production, with a chamber size of 30" x 30" (76.2 cm x 76.2 cm). The reactor utilizes a cold wall cylindrical chamber, which is comprised of stainless steel and a graphite lining. The graphite lining helps to minimize the thermal stress of the chamber by providing thermal dispersal while allowing for the repair of depleted surfaces within the chamber. The chamber also includes a pyrolytic boron nitride (PBN) platform and an anode hood. The reactor is outfitted with a single frequency 13.56 MHz VHF RF power source, with a power range of 250-500 Watts. The equipment is designed for use in cleanroom environments and comes with a vacuum-rated view port window and I/O connectors for remote communication. The reactor also features programmability, allowing for the presets of recipes, and the selection of up to 50-step programs for increased control and flexibility. The recipe presets provide a range of process parameters, such as gas flows, gas mixtures, pressure, RF power, exposure time, bias, and temperature. The system is equipped with an overpressure mode and pressure maintenance, which helps to reduce particle contamination by allowing the user to evacuate the chamber quickly. The unit also comes with a temperature control machine for the PBN platform, which provides additional control over deposition rates and configurations. The reactor provides excellent uniformity and is capable of achieving process step repeatability of 0.5 percent. It also has a temperature uniformity of up to 0.2 percent and is capable of providing a quartz stability of 0.2 percent/0.5 percent from timeouts and micro-feedback. Overall, AMAT 0010-03254 Reactor provides a reliable and efficient solution for advanced PECVD applications.