Used AMAT / APPLIED MATERIALS 0010-03254 #293646134 for sale

AMAT / APPLIED MATERIALS 0010-03254
ID: 293646134
Wafer Size: 8"
Vintage: 2023
E-Chuck assembly for MCA, 8" 2023 vintage.
AMAT / APPLIED MATERIALS 0010-03254 reactor is a high-efficiency process chamber designed for semiconductor-grade processing. It employs Variable Reactant Supply (VRS) two-zone/three-zone technologies to deliver ultimate throughput and control of reactants in a variety of processing recipes. The reactor uses a combination of gas, plasma and thermal source to drive reactions. The Variable Reactant Supply (VRS) two-zone/three-zone design gives the user the flexibility to adjust the desired process recipes. The reactor features a high-throughput process chamber capable of doing multiple process recipes simultaneously in a single chamber. The chamber is capable of doing high throughput processes with low pressure droplets, making it suitable for a variety of applications. Its high-volume capacity and wide range of process temperatures also help to contribute to its efficiency and effectiveness. In addition, the reactor is capable of performing high-energy processes and damaging substances with advanced charge compensation. The reactor is equipped with an intuitive controller and touch screen interface, which allows for easy operation and monitoring of the process. The controller includes intelligent and highly powerful software for controlling and monitoring the process parameters. It also includes easily programmable process recipes with advanced efficient cycle control. The user can adjust the temperature, gas chemistry, pressure, and cycle times to optimize the process recipe. AMAT 0010-03254 reactor is an advanced process chamber designed to provide maximum throughput and quality. Its Variable Reactant Supply (VRS) two-zone/three-zone design provides the user with the flexibility to adjust the process recipes to achieve the desired results. The reactor has an intuitive controller and touch screen interface, which makes it easy to use and monitor the process. Its high-volume capacity and wide range of process temperatures make it an ideal choice for a variety of applications.
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