Used AMAT / APPLIED MATERIALS 0010-03254 #293665750 for sale

AMAT / APPLIED MATERIALS 0010-03254 is a reactor equipment made by AMAT, Inc. for use in a wide range of industrial processes. It is specifically designed to improve production, accuracy, and process control when used in front end semiconductor device fabrication. The reactor system utilizes a combination of heated and cooled reactive plasma to create a chemical reaction that can be used to precisely and precisely deposit material on a surface. AMAT 0010-03254 is composed of a stainless steel reaction chamber, a high frequency magnetic generator, a single-stage high voltage coupling transformer, a high voltage plasma source and a generator-driven RF power supply. The heated and cooled reactive plasma is generated by the magnetron and powered by the high frequency generator. The high voltage coupling transformer is then able to accurately regulate the plasma delivery of voltage and current to the reaction chamber. APPLIED MATERIALS 0010-03254 is governed by a programmable controller which allows users to adjust the heat and reaction parameters to customize the process for specific needs. The reaction chamber is able to produce reactive nitrogen, oxygen, hydrogen, and chlorine to oxidize and passivate surfaces before deposition. The reaction chamber can also achieve high purity deposition by controlling feed gases such as argon, krypton, xenon, and helium with high accuracy. 0010-03254 is designed for precision and control with programmed view, pressure, heat, and gas control to allow for specialized chemical-mechanical polishing. It has a loadlock chamber to allow for the incoming and outgoing of samples and cassettes and has integrated gas delivery for both dry and wet chemistry. The reactor unit is supported by a restorable end station and a quartz or graphite wafer boat support which can keep up to eight wafers. It also features an additional temperature input for controlling other wafer-boat preheating techniques. In summary, AMAT / APPLIED MATERIALS 0010-03254 is a multi-function reactor machine designed to increase process control and accuracy in semiconductor production and fabrication. It features a stainless steel reaction chamber, a high frequency magnetic generator, a high voltage coupling transformer, a high voltage plasma source, and a generator-driven RF power supply. The programmable controller allows users to customize the process for specific needs and it offers a loadlock chamber, a restorable end station and integrated gas delivery. Moreover, it has an additional temperature input for controlling other wafer-boat preheating techniques.