Used AMAT / APPLIED MATERIALS 0010-03254 #9004838 for sale

AMAT / APPLIED MATERIALS 0010-03254 is a full-wafer-processing reactor specifically designed for PECVD and oxidization applications in semiconductor and MEMS fabrication. The reactor is ideally suited for depositing low dielectric layers and protective films, as well as for forming anti-reflective coatings. AMAT 0010-03254 has a heated, rotatable sample chamber with a diameter of 200 mm and can accommodate up to fifteen wafers. An advanced single-shroud design ensures uniform distribution of reactant gases and uniform side wall deposition. The substrate bias voltage is adjustable from 0 to 700V, with an adjustable bias frequency. The reactor is equipped with an active mechanical shutter equipment for controlling reactant concentration, temperature and pressure for optimum process results. This system is also equipped with an advanced process control unit to optimize deposition reproducibility and repeatability. In addition, APPLIED MATERIALS 0010-03254 has an advanced evacuation machine for fast and efficient purging of the chamber with nitrogen or argon. The reactor is designed to easily integrate into existing or new fabrication systems. The modular design makes installation and upgrade straightforward. The design enables the operator to quickly set up and change process recipes, as well as perform in-situ diagnostics. In general, 0010-03254 is an advanced, high-precision PECVD/oxidation reactor designed to provide high-quality deposition results. Its design allows for fast and efficient formation of low dielectric layers, protective films and anti-reflective coatings. Its modular design enables easy integration into existing fabrication systems, and its advanced process control tool ensures repeatability and reproducibility of the deposition. This robust, reliable and versatile reactor is the ideal choice for semiconductor and MEMS fabrication.