Used AMAT / APPLIED MATERIALS 0010-03254 #9060929 for sale

AMAT / APPLIED MATERIALS 0010-03254 is a AMAT Single Wafer Reactor, specifically designed to meet the exacting requirements of the semiconductor industry. This model is a high-performance and reliable equipment targeting both high volume and low cost production of integrated circuits. It is an ideal solution for manufacturing semiconductor wafers such as DRAM, Flash, ASIC and others. AMAT 0010-03254 Single Wafer Reactor is a thermal chemical vapor deposition (CVD) system, utilizing a cold walled reactor chamber. It uses Tube Furnace Technology for its heating source, for maximum reliability and temperature uniformity. The chamber also includes a full integration of the RF and DC sources for multi-level dielectric deposition. The reactor is capable of operation at a maximum temperature of 1000°C, as well as other settings that can be customized to the specific needs. The entire machine has been designed for ease of use, with an intuitive and easy to use graphical user interface, allowing even less experienced personnel to operate the reactor with great success. The control system is also flexible and very easy to use, and can be quickly adjusted to meet the changing needs of the production process. In addition, the reactor has on board diagnostics, making it easier to detect process issues and to prevent potential catastrophic events. This includes process control transfer configuration, alarm configurations and emergency shutdowns. APPLIED MATERIALS 0010-03254 is a powerful and reliable Single Wafer Reactor, and is the ideal solution for both high volume and low cost production of integrated circuits. Built with reliability and safety in mind, it is the perfect choice for manufacturers of semiconductor wafers.