Used AMAT / APPLIED MATERIALS 0010-03254 #9069114 for sale

AMAT / APPLIED MATERIALS 0010-03254, or AMAT 0010-03254 reactor, is a tool used primarily in the manufacturing of semiconductor wafer processing applications. APPLIED MATERIALS 0010-03254 reactor is an advanced equipment with several installed components for ultra-high precision chambers, including UP3000 polysilicon deposition chamber, View 5000 e-gun Excitation and the Batch Vacuum Furnace 9400. This versatile system allows for different types of processes from LPCVD and Rapid-Thermal-Processing technologies, to Sputtered Deposition for inter-layer dielectric. The UP3000 Polysilicon Deposition Chamber is a large-scale processing vessel that can be configured for multiple types of processes. It has a patented dual-catalyst gas delivery unit, allowing for precise control over deposition rates. The View 5000 E-gun Excitation Machine is a high-power, pulse-driven electron excitation tool that is used to enhance the efficiency of the deposition process. It has a maximum power of 160kV and a pulse length of 1 microsecond. Additionally, it is equipped with a magnetic jet nozzle that allows for precise control over the deposition process. Finally, the Batch Vacuum Furnace 9400 is a multi-stage process chamber that can perform a variety of high-temperature applications such as rapid thermal annealing and oxide removal. It has a maximum temperature of 1300°C and is equipped with real-time temperature profiling with adjustable time and temperature profiles. Overall, 0010-03254 reactor is a powerful tool for the high-precision semiconductor wafer processing industry. It offers highly precise control over the deposition process, as well as a versatile range of applications. With its various integral components, it can provide unparalleled performance and reliability for a wide range of semiconductor fabrication processes.