Used AMAT / APPLIED MATERIALS 0010-03254 #9223200 for sale

AMAT / APPLIED MATERIALS 0010-03254
ID: 9223200
Wafer Size: 8"
MCA E-Chuck, 8".
AMAT / APPLIED MATERIALS 0010-03254 is a high performance, low cost linear accelerator designed to provide high intensity and uniform ion acceleration. The reactor features a compact, cylindrical design and is compact enough to fit into most semiconductor fabrication lines. The reactor is manufactured of high quality stainless steel components and aluminum shields, providing superior durability and superior performance in a variety of applications. The reactor is engineered to provide superior uniformity of ion beam current density, with a flat current profile. Utilizing a combination of an adjustable radial shortening, adjustable vacuum, and adjustable magnetic on/off parameters, this reactor allows users to tailor the ion irradiation dose to their specific needs and applications. This makes it well-suited for multiple beam energy treatments or fluorination. The reactor also includes a beam modulation system for voltage shaping. This system helps to improve the uniformity of dose delivered to the sample. This system can be programmed to shape the beam plus/minus one hundred volts over a 200 millivolt range giving users complete control over the delivered dose. In addition to uniformity of dose, the reactor is also built to provide superior operational stability. The ion source is mounted on a stable, vibration dampened base, which helps to reduce spot movement and beam uniformity bias due to external disturbances. The accelerator accelerator structure also features durable vibration absorbers to further reduce motion, ensuring stable beam characteristics and uniform dose to the sample. Finally, the reactor is designed with an external generator to ensure the ion energies can be easily adjusted to meet user's requirements. This generator can be used to increase the beam energy in order to improve the throughput of the reactor. Overall, AMAT 0010-03254 is a reliable and efficient reactor that provides superior performance in a variety of applications. Options are available to tailor the unit specifically to each user's needs. With its superior uniformity and stability, this reactor is the ideal choice for high intensity, uniform ion acceleration and excellent dose uniformity.
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