Used AMAT / APPLIED MATERIALS 0010-03843 #9269049 for sale

AMAT / APPLIED MATERIALS 0010-03843 is an advanced deposition reactor that has been designed to provide high quality materials deposition. It is widely used in the fields of advanced semiconductor manufacturing, advanced packaging, and MEMS. This next-generation reactor is an industry-leading source of precision deposition for materials such as poly-silicon, tungsten, aluminum, carbon, and others. AMAT 0010-03843 is constructed with a quartz chamber, ceramic cavity, and quartz window. The quartz chamber is hermetically sealed and is the main hub for the deposition process. The ceramic cavity contains a high-energy electron beam gun and a high-temperature heating element to create an optimal environment for the deposition process. The quartz window is a benefit to the reactor because the presence of the quartz window reduces the need for complex vacuum pumps and lines. The high-energy electron beam gun is used to inject high-density particles into the reactor chamber, enabling crystallization and the creation of a homogeneous coating of a particular material, such as a titanium nitride or tantalum nitride. Additionally, the electron beam gun has the capacity to generate spatial shuttering with a small spot of material deposition, allowing for small to medium size feature placements on a variety of substrates. The heated zone enables a homogeneous coating of a chosen material to be deposited with better thickness control compared to using only the electron beam injections. Additionally, APPLIED MATERIALS 0010-03843 has the benefit of an active self-refresh system that cycles through specific deposition parameters in order to evenly distribute a material by accreting the material in an even manner. With this self-refresh feature, the reactions parameters can be set to a static mode for consistent coatings with uniform thickness. 0010-03843 also includes a dual-chamber design with independently sealed inner and outer chambers, providing a benefit to deposition that requires both temperature and pressure variation. By isolating the heated chamber from the substrate, operators are able to contain their work, independently set temperatures and pressures, and save time between process steps. Overall, AMAT / APPLIED MATERIALS 0010-03843 is an advanced deposition reactor that offers high-level performance and reliability with a wide range of benefits. The combination of the quartz chamber, ceramic cavity, high-energy electron beam gun, and dual-chamber design all allow for a reliable and reproducible deposition of metals and compounds on a variety of substrates.