Used AMAT / APPLIED MATERIALS 0010-03843R #9270630 for sale

AMAT / APPLIED MATERIALS 0010-03843R is a high-temperature process reactor that is designed to be used in the semiconductor industry for processing wafers. It is an economical, easy to use and reliable processor, making it an excellent choice for any production facility. The reactor is equipped with a high-performance heat spreader that is designed to transfer heat evenly throughout the reactor and ensure uniform temperature control throughout the process. The temperature can range from 500°C to 1500°C, depending on the process being performed. The reaction module has several safety features that help ensure the safety of personnel, including a chamber locking mechanism, over-temperature control, and a gas sentry system that senses toxic and corrosive gases. The reactor chamber is rectangular in shape, and it features an enclosed design that includes an upflow longitudinal wall. This provides excellent uniformity and thermal cycling stability, which is a critical factor for semiconductor processing. The chamber is equipped with several ports that allow for easy means of loading/unloading. AMAT 0010-03843R is equipped with several state-of-the-art temperature control systems, including temperature controllers and thermocouples. It also include an RF generator, which is used to provide power to the reaction chamber. The reactor features state-of-the art filtration systems that allow for the removal of particles from the process flow, to ensure high-purity products. Additionally, each chamber port is designed with a flow-maximizing system which ensures quick and efficient processes. APPLIED MATERIALS 0010-03843R is installed with a Mitsubishi PLC controller that is capable of controlling up to four reaction chambers. The PLC's on-board display and keypad interface allows operators to monitor the process and make necessary adjustments at any time. The reactor is designed for easy, user-friendly operation. It is equipped with several automatic features and a user-friendly interface that help operators to easily monitor, control, and adjust the process. Overall, 0010-03843R is an excellent choice for any production facility that requires a reliable and easy to use process reactor. The reactor is capable of performing difficult processes such as chemical vapor deposition (CVD) and ion implantation with accuracy, reliability, and uniformity. It features state-of-the art temperature control, particle and gas filtration systems, as well as an easy to use controller. For a reliable, economical, and efficient reactor, AMAT / APPLIED MATERIALS 0010-03843R is an excellent choice.