Used AMAT / APPLIED MATERIALS 0010-03843R #9270795 for sale

AMAT / APPLIED MATERIALS 0010-03843R is a reactor developed for use in semiconductor manufacturing and deposition applications. The reactor is designed to provide high quality etch and deposition processes required for the production of advanced semiconductor devices. It utilizes a combination of high-powered vacuum and a range of gas injection features to control the etch and deposition parameters precisely. AMAT 0010-03843R reactor is constructed out of a stainless steel vacuum chamber vessel, which is viewable through an observation window. The chamber is outfitted with a number of ports for sealant, gas, and pump connections. The inside of the reactor is also equipped with two Planar Shields, located on the top and bottom. These shields are designed to prevent any spills and particle sources from entering the reactor during the process. APPLIED MATERIALS 0010-03843R reactor is powered by a series of external high voltage power supplies. These power supplies feed into the reactor's Chamber Controller, which varies the voltage between the two Planar Shields depending on the desired process needs. A set of high-power isolated switching valves allow the reactor to inject exhaust and process gases into the chamber. Additionally, the reactor is designed to cycle any exhaust and waste particles out of the chamber via a range of venting and exhaust connections. 0010-03843R reactor is equipped with a range of features that allow it to operate with a high level of accuracy and efficiency. Most notably, it features a dynamic end point detection equipment that can accurately detect partial or full etch in process layers. This system also allows the reactor to detect the presence of remaining particles within the chamber. Furthermore, its control unit implements a set of non-linear feedback and feed-forward algorithms, which allow the reactor to optimize its process performance based on parameters such as temperature, pressure, and gas flow rate. In conclusion, AMAT / APPLIED MATERIALS 0010-03843R is an advanced, high-tech, reactor that is designed for applications ranging from the production of advanced semiconductor devices, to various etch and deposition processes. Its robust design, precise control machine, and dynamic end point detection tool enable it to deliver high quality results with a high level of efficiency and accuracy.