Used AMAT / APPLIED MATERIALS 0010-04450 #9043624 for sale

AMAT / APPLIED MATERIALS 0010-04450 Reactor is a turbo-molecular, high-vacuum growth equipment designed specifically for etching and deposition processes in semiconductor fabrication. This system is constructed from stainless steel and utilizes a powerful UHV turbo-molecular pump which operates in either vacuum or atmospheric pressure. The UHV pump is complemented by a gas manifold, which allows for a selection of up to six different gases. The selected gases—typically nitrogen, oxygen, and argon—are used for gas supply and pressure regulation for all deposition and etching processes. The reactor is designed for the highest achievable process windows and temperature homogeneity, with an electric furnace operating from 10° to 1202°C (50° to 2196°F). The temperature is maintained by a combination of dual-zone heaters, a halogen oven, and an inert gas abatement unit. The inert gas abatement machine helps to eliminate oxidation on the vacuum chamber walls and helps to maintain very low base pressure levels. AMAT 0010-04450 Reactor also features an integrated particle collection and filtration tool designed to protect the process equipment from particulate contamination. The unit can be operated in one of two modes; either with a drain valve or a bell-jar chamber. The drain valve operates by allowing the gases to pass through a filter, while the bell-jar chamber collects the particles in a dry chamber where they can be later extracted. The Reactor also includes several other systems that help to facilitate the etching and deposition process. These include a power supply with adjustable current, a gas supply manifold, and a digital controller that allows operators to precisely set the process parameters during a recipe. The asset also includes endpoint detection and emittance control, which help to optimize process performance. Overall, APPLIED MATERIALS 0010-04450 Reactor is a powerful and reliable tool that can be used to perform etching and deposition processes with a high degree of precision and accuracy. This model is able to cost-effectively and efficiently carry out the most demanding semiconductor fabrication processes and provide the highest quality products possible.