Used AMAT / APPLIED MATERIALS 0010-09103 #293658078 for sale

AMAT / APPLIED MATERIALS 0010-09103 Reactor is an automated production tool used for etching and cleaning wafers in the semiconductor industry. Built with a vacuum process chamber, the equipment is equipped with an electrostatic chucking (ESC) system for uniform wafer placement and rotation. The reactor has a vertical co-planarity design, which ensures that the substrates are deposited in a parallel orientation relative to the electrodes for superior process uniformity. Offering reliable etching and cleaning solutions with high-level wafer-to-wafer repeatability, it is an ideal choice for production engineering. Its automated operation is controlled by a full-capability computer with an advanced user interface. It is equipped with precise process control unit, digital video machine, live curvature measurement, and a cooling tool. An ionized gas delivery asset is also available, providing a stable, uniform and precise etching process. Its automatic loading and unloading capabilities also ensure that the substrate remains in the same position throughout the entire process. AMAT 0010-09103 Reactor is capable of performing a wide variety of processes, including oxide removal, selective etching, thin film deposition, anisotropic etching, and deep silicon etching with process control and improved through-substrate uniformity. It is designed for an extended range of substrates, substrate sizes, and environmental conditions, with the capability to implement a range of process gas supply systems to ensure reliable etching. The vacuum model is designed for high vacuum level and top process performance, offering superior temperature control, quartz temperature monitoring, and adjustable furnace temperature. The equipment is equipped with several safety features, including an emergency stop switch, interlock relays, and dust monitors. It also includes a sophisticated process monitoring system, adjustment of power levels, and a touch-screen graphical user interface. The reactor provides excellent uniformity and throughput, making it an ideal choice for the production engineering industry.