Used AMAT / APPLIED MATERIALS 0010-09178 #293658039 for sale

ID: 293658039
Cassette handler bottom.
AMAT / APPLIED MATERIALS 0010-09178 Reactor is a specialized tool designed for processing and cleaning of inorganic semiconductor materials. Its design incorporates a 200 mm chemical vapor deposition (CVD) chamber, a heated electroplating module, and a robust mechanical and electrical platform. This reactor is capable of semiconductor deposition, stripping, and integration processes at high temperatures and pressures. AMAT 0010-09178 Reactor is designed to enable safer and more reliable semiconductor device production processes. It is controlled by a single integrated command set that is accessed through an Ethernet connection or over the air. All elements of the reactor are traceable to an internal safety controller and can be monitored for optimal performance. The reactor also has several safety features that minimize the risk of accidental contamination or over-processing of products. At its core, APPLIED MATERIALS 0010-09178 Reactor is a vertical CVD chamber that can reach up to 1,000°C. The chamber is equipped with heating elements, fan-assisted thermocouples and internal gas distribution and mixing. The electrode plating module has a direct-drive motor-generator system to give excellent stability and accuracy. By utilizing advanced PLCs and a built-in safety monitoring system, the reactor can be used for any application with tight accuracy and control requirements. 0010-09178 Reactor also provides an inert gas environment that eliminates product contamination and improves process efficiency. A full range of process parameters can be controlled and monitored such as temperature, pressure, and reactant variances. This helps to improve efficiency and reduce waste. Additionally, this reactor is great for uniformity and quality control due to its precise deposition, stripping, etching, and coating capabilities. Overall, AMAT / APPLIED MATERIALS 0010-09178 Reactor provides a safe and reliable processing environment with tight temperature and pressure control. This versatile reactor can handle a broad range of semiconductor processing needs making it ideal for covering a range of industrial production needs.
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