Used AMAT / APPLIED MATERIALS 0010-09416 #152193 for sale

AMAT / APPLIED MATERIALS 0010-09416 is a plasma chemical vapor deposition (CVD) reactor developed by AMAT, Inc. and used extensively for the fabrication of semiconductor, nanostructure and optical devices.The main components of AMAT 0010-09416 reactor include an inner chamber, a plasma source, an exhaust, a vacuum equipment, and control systems for process related variables such as gas flow, pressure and temperature. The inner chamber of APPLIED MATERIALS 0010-09416 is cylindrical in shape and constructed from aluminum and stainless steel. It has a flat bottom which houses the substrate on which the film is deposited. The substrate can be either a Si wafer or a glass or quartz substrate. The chamber is under high vacuum (typically on the order of 10-3 Torr) during a deposition process. A generalized flow of the process gas enters the chamber through a gasbox at the center of the chamber, located directly above the substrate. The flow rate is regulated by the control system, and specific gases may be added or removed during the process. The plasma used in 0010-09416 is a capacitively coupled, non-thermal AC plasma. This is generated by an RF power source which acts as an antenna to the dome-shaped plasma source located at the center of the chamber. The RF power source is designed to provide a specific power density based on the process temperature and film requirements. Plasma is used to energize and chemically activate the reactants to form the desired material. The exhaust port removes the reaction by-products from the chamber and is typically connected to a vacuum unit. The control systems for AMAT / APPLIED MATERIALS 0010-09416 allow for exact manipulation of the process parameters, such as pressure, temperature, reactant ratios, and gas flow rates. This is done using a combination of mechanical and/or digital controllers, both of which are fully programmable. Additionally, the control machine may be used to analyze process data and automatically make corrections that result in improved process uniformity and repeatability. Overall, AMAT 0010-09416 is a reliable and effective reactor which is widely used in a number of applications involving the production of semiconductor, nanostructure and optical devices. Its advanced capabilities, including its ability to precisely manage process parameters and its ability to analyze data, make it an invaluable tool for a variety of fabrication processes.