Used AMAT / APPLIED MATERIALS 0010-09416 #180792 for sale

AMAT / APPLIED MATERIALS 0010-09416 reactor is a high-performance, low-maintenance tool specifically designed for production of dense and uniform materials. This reactor makes use of intense energy sources to form substrates with physical properties unachievable with traditional CVD and PVD processes. AMAT 0010-09416 reactor has a robust design that allows for reliable and consistent operation. The reactor has a cylindrical chamber design and is equipped with multiple door ports. This allows for the easy loading and unloading of substrates and deposition material. Since the deposition materials are placed in the chamber as a gas or a liquid, APPLIED MATERIALS 0010-09416 reactor is designed to provide rapid and homogeneous heating and uniform deposition. In addition, the reactor design features an advanced cooling system for a protective atmosphere during the process. The Plasma Enhanced Chemical Vapor Deposition (PECVD) process used in 0010-09416 reactor incorporates the use of reactive gases to form desired deposits on the substrate. During the PECVD process, a high-frequency plasma is generated between the substrate and the gas. This causes the gas to decompose into ionized radicals and electrically-charged atoms which then interact with the substrate to form the desired material. AMAT / APPLIED MATERIALS 0010-09416 reactor also makes use of electromagnetic actuators to control various parameters such as power and pressure. This enables precise tuning of the parameters to ensure a uniform deposition. In addition, the reactor is also designed to sense electron emission from the active component and can control the gas flow to maintain a steady state of pressure for stable deposition. AMAT 0010-09416 reactor is a powerful tool for forming a wide range of material structures. Its advanced features and reliable operation provide consistent and accurate material fabrication. Its robust design and reliable performance allow users to take full advantage of the benefits of PECVD processes without worrying about the unpredictability of traditional CVD and PVD techniques.