Used AMAT / APPLIED MATERIALS 0010-09416 #293602314 for sale

AMAT / APPLIED MATERIALS 0010-09416 is a multi-component, multi-zone process reactor that is used primarily in the semiconductor industry. It is designed for applications including oxidation, nitridation and etching of thin films. The reactor is typically mounted on a ring stand, and is used for the automation of thin film stack processing. AMAT 0010-09416 reactor is comprised of two main parts, the process chamber and the flange. The process chamber is a housing that contains up to four multi-zone process zones. Each zone is heated using a standard 2000 watt RF source and can be independently controlled and set to different temperatures. The flange is a specially designed flange which mechanically connects the process chamber to the vacuum system. The process chamber is divided into up to four multi-zone process zones. Each zone is separated by an adjustable based wafer table assembly and has a separate high temperature Lamp or Cordless lamp high temperature source. The adjustable base wafer table assembly allows the wafer to be moved horizontally by stepper motors, mapping it into the different zones for different processes. The temperature in each of the zones is independently controlled and set to temperatures from the limit of -50°C to the maximum limit of +1000°C with a total power of up to 2000 watts. The reactor's vacuum system includes an evacuator line which is connected to the flange. It is powered by an electronic motor pump and provides a maximum pressure of 500 mTorr. The exhaust line is also connected to the flange and has a pressure of up to 1 Torr. APPLIED MATERIALS 0010-09416 reactor has an overall weight of 290lbs and dimensions of 43.5in(H)x43.5in(W)x21.5in(L). It is equipped with a safety shut-off valve, digital flow monitor and an exhaust port with safety valve. It is designed with safety in mind to ensure that the reactor is operated in compliance with applicable safety regulations. In conclusion, 0010-09416 is a multi-component, multi-zone process reactor designed for thin film stack processing in the semiconductor industry. It is equipped with a safety shut-off valve, digital flow monitor, exhaust port and more, and is designed to operate in compliance with applicable safety regulations. As a result, the reactor is an effective tool for high-temperature process applications like oxidation, nitridation and etching of thin films.