Used AMAT / APPLIED MATERIALS 0010-09416 #293618132 for sale

AMAT / APPLIED MATERIALS 0010-09416 is an etching reactor specifically designed for thin films deposition. It is a high throughput, large capacity etching reactor that is used for large-scale semiconductor wafer processing. This reactor can be utilized for thin-film deposition, plasma-based ashing, and etching processes. It is equipped with a high-pressure enhanced plasma technology for depositing thin films with faster cycle times and improved uniformity. AMAT 0010-09416 reactor consists of an inner etch chamber and an outer concentric source chamber. The inner chamber is used to contain the etchant, while the outer chamber contains a source of plasma energy. The source chamber is equipped with six concentric torches that are capable of adjusting the energy level and gas flow rate. The torches are used to scan the wafer and precisely control the deposition rate. The equipment is automated, with cloud-based machine learning providing precise control over the etching process. The reactor is capable of generating highly precise etching patterns, which are essential for advanced semiconductor processes. The system has an integrated process monitor that provides detailed control and data analysis of the etching process. The reactor also features a specialized terminal unit with plate/strip storage, automated transfer, and optimized chamber cleaning. This unit helps to maximize wafer throughput rate and minimize wafer damage. It also enables precise measurements of the etched volume, ensuring accurate etching and leading to better outcomes. The process monitor records the complete etch process, enabling further process development and optimization. The overall unit is designed to be flexible and has been designed to implement advanced etching processes. It features advanced diagnostics to identify and correct anomalies, while its built-in diagnostic machine can be used to identify anomalies in the process and make corrections. The tool is EPA compliant and is also EMC certified for compatibility with other equipment. It can also be integrated with automation systems for fast, efficient and precise operation. Overall, APPLIED MATERIALS 0010-09416 is a highly-engineered etching reactor that offers reliable performance, accurate results and high throughput. The asset has been designed specifically for advanced thin film deposition, eliminating the need for complex chamber setups, while providing precise control over the deposition process. This etching reactor is the ideal solution for large-scale wafer processing.