Used AMAT / APPLIED MATERIALS 0010-09416 #293824898 for sale

AMAT / APPLIED MATERIALS 0010-09416 is a high performance reactor designed for the manufacture of advanced semiconductor materials. This reactor can be used to produce a range of semiconductor materials both organic and inorganic. It is a single-wafer, production-type reactor and is capable of operating at pressures of up to 300 mbar and temperatures between room temperature and 1500°C in a controllable atmosphere. The reactor consists of a tapered quartz tube with a vacuum sealed exit, an adjustable sample heater, ceramic insulation, stainless steel flanges, a mass flow controller, an inlet port and an outlet port. The quartz tube is heated through the use of infrared lamps. During operation, a sample or "wafer" is placed on the heated sample heater and is exposed to a range of temperatures and pressures that can be controlled by the reactor's computers. The sample's surface can be modified and etched using a variety of processes, including physical vapor deposition (PVD) and chemical vapor deposition (CVD). This reactor's other capabilities include an oxygen/nitrogen/argon mixture gas source, with an adjustable gas flow rate; an ultra-high vacuum system with a basic pressure of 10-6 Torr; a temperature ramp system capable of rapidly heating the substrate up to 1500°C; and an ultra-high temperature annealing chamber. In addition, the process parameters of the reactor can be adjusted for specific wafer requirements. AMAT 0010-09416 reactor can be used to synthesize a variety of compounds, including semiconductor materials such as gallium arsenide, silicon carbide and germanium nitride. This reactor is highly efficient and can be used to achieve high yields of product. It is also very versatile, as its parameters can be customized to meet specific requirements. With its high ease of use, it is an ideal reactor for the manufacture of advanced semiconductor materials.