Used AMAT / APPLIED MATERIALS 0010-09416 #9005021 for sale

AMAT / APPLIED MATERIALS 0010-09416 reactor is a combination remote plasma source and reactor designed specifically for etching, deposition, and cleaning processes in the semiconductor industry. The reactor is equipped with a variable-frequency radio frequency generator that generates a high-frequency, low-power waveform suitable for etching materials such as SiO2 and Si. The plasma generated by the generator is then fed into the reactor chamber, where it serves to activate the precursor molecules which then deposit on the wafer. The reactor chamber also allows for precise control of the temperature and pressure of the process. The reactor chamber is designed to deliver uniform, repeatable processes with low contamination levels. A plasma showerhead is used to homogeneously distribute the plasma over the surface of the wafer, while a horizontal wafer motion stage is used to achieve uniform etch profile and speed. Inert gas is introduced to the chamber through top and bottom gas injection to control the pressure and temperature of the gas within the reactor chamber. The chamber operates within an operating temperature range of -20°C to 180°C and pressures of up to 1 Torr. The reactor can be configured either as a single wafer or batch system with up to six chambers. The six-chamber system is equipped with a process control software and a three-dimensional diagram of the entire process. This software enables the engineer to accurately control the desired parameters such as pressure, flow rate, and temperature of the plasma throughout the process. The system offers a range of operating pressure options, including ultra-low pressure, high-vacuum, and atmospheric pressure, so that the applied process can match the requirements of the customer's process. AMAT 0010-09416 reactor is a powerful and reliable tool for a wide range of materials processing tasks. With its accurate and repeatable process control, flexible operating parameters, and low contamination levels, the reactor is an ideal choice for producing high-quality device structures for the semiconductor industry.