Used AMAT / APPLIED MATERIALS 0010-09416 #9026398 for sale

AMAT / APPLIED MATERIALS 0010-09416 reactor is an advanced piece of equipment designed for semiconductor fabrication processes. This reactor provides the necessary functions and parameters to create high-quality, defect-free wafers and devices. The reactor contains a number of advanced components such as an inductively coupled plasma (ICP) source and rapid thermal annealing (RTA) systems. The ICP source contained within the reactor allows for advanced processes such as etching, polysilicon deposition, and dopant implantation. This privileged source of electrical energy enables surface treatments on various substrate materials. These surface treatments are invaluable in the semiconductor manufacturing process. The ICP source is also capable of producing reactive and inert species for etching purposes. This allows for fine-tuning of the device fabrication process. Furthermore, the ICP source and its power supply are well-protected with AI-enabled cooling systems, ensuring consistent temperature across the reactor. The RTA equipment is a significant feature of AMAT 0010-09416 reactor. This system offers high throughput and low thermal budgets, meaning that as chips shrink and process complexity increases, the RTA unit can still process a wide variety of applications and functions. The RTA machine also offers advanced features including recuperative heating, which allows the reactor to heat the wafer quicker so that the process is completed in shorter times. In addition to the ICP source and RTA systems, APPLIED MATERIALS 0010-09416 reactor also contains a number of other features. These include a heating & cooling tool, a vacuum-tight process chamber, a high-precision gas delivery asset, and other advanced components. In conjunction, all of these features allow the reactor to process epitaxial growth, GaAs deposition, and more while achieving low defect rates. This allows for extremely precise structures that suit a wide variety of individual applications. Finally, the reactor is controlled by an intuitive user-friendly software interface, ensuring efficient process control and automation. Overall, 0010-09416 reactor from AMAT is an advanced piece of equipment used in semiconductor fabrication processes. The reactor contains a number of advanced components such as an ICP source and RTA systems, which allow for the processing of extremely precise structures for a variety of different individual applications. The reactor is controlled by an intuitive user-friendly software interface, ensuring efficient process control and automation. It is also well-protected with AI-enabled cooling systems, ensuring consistent temperature across the reactor.