Used AMAT / APPLIED MATERIALS 0010-09416 #9111980 for sale

AMAT / APPLIED MATERIALS 0010-09416 is a wafer dual-chamber reactor that provides unmatched control and flexibility for advanced processes used in device manufacturing and research. This chamber features a clean environment with tight temperature control, high-quality sources of gas, and reliable long-term operation. It is designed to work with either production processes or research tasks that require advanced performance and handling. AMAT 0010-09416 features a single stainless steel cathode chamber and a quartz upper chamber that can be used for anodization, cleaning, desorption, bulk oxide growth, and depositions. The cathode chamber has three inductively-coupled radio frequency (RF) sources and an electron cyclotron resonance (ECR) source. The ECR source is able to generate a uniform plasma using electromagnetic fields to heat and ionize material. The three RF sources work independently to provide different levels of RF power, allowing for precise and customized deposition profiles to be achieved. The RF sources can also be used to create ultra-fast plasma processing conditions, a feature made possible by the chamber's upper limit on RF power. The chamber has a high-temperature capability of up to 1200℃ and a low-temperature capability of as low as -50°C. This range is maintained by a combination of a heating fiber and a cooling channel within the chamber. The chamber's ultra-low thermal mass also contributes to the accuracy of the temperature regulation. The chamber also includes an advanced vacuum system that is optimized for ultra-high vacuum and features a 5-bar pressure range. To further optimize processing performance, APPLIED MATERIALS 0010-09416 has a host of sophisticated gas delivery options. Specifically, the reactor is equipped with two mass flow controllers (MFCs), five gas lines, and a gas line monitoring system. The MFCs allow for tunable gas fluxes and enable users to take advantage of features such as dynamic precursor delivery. The five gas lines are designed to handle a variety of gas species and mixture combinations. The gas line monitor can be used to measure the gas profiles inside the chamber, allowing users to take into account temperature-dependent production rates. 0010-09416 is the ideal solution for applications that demand the highest levels of process performance and control. Its comprehensive range of features, flexibility, and capability make it suitable for use in any process development or production environment.