Used AMAT / APPLIED MATERIALS 0010-09416W #293644644 for sale

AMAT / APPLIED MATERIALS 0010-09416W is a reactor used for materials synthesis and deposition for research and industrial applications. The reactor is a high-vacuum, injection-molded quartz-body chamber designed for deposition of thin films of semiconductor materials at low pressure. It is a horizontal, cylindrical chamber featuring a two-stage turbomolecular backing pump and two inlet ports located on the side for delivery of precursor materials. The pressure in the chamber is maintained between 5 x 10-5 and 2 x 10-5 Torr during operation. The reactor is fitted with a unique shutter equipment that allows for simple loading of wafers into the chamber and processing at low pressures. The shutter also features embedded infrared and ultraviolet sensing lines dedicated to monitoring the process. Heating is provided by two independently controlled resistive elements providing temperatures up to 1000°C and is coupled with a gas mixer module with 5 gas lines. There is also an electronic gate valve located at the back of the reactor. Deposition is propelled by a unique quartz inertial showerhead operating with a total pressure of 1 milli-Torr, delivering materials perpendicularly to the substrate for improved uniformities and step coverage. The quartz showerhead can also be mounted on an adjustable bracket for additional flexibility. Single or multiple substrates up to 200mm in size can be accommodated in the reactor. The control system is designed to automate thin film deposition processes such as sputter deposition, chemical vapor deposition, and atomic layer deposition. The unit features computerized operator interface terminals, recipe programming and a fine-adjustment valves that enables precise control over the entire process, including pressure, flow, temperature, and other variables. Data logging can be performed as well, to monitor, review and document the process. AMAT 0010-09416W reactor is equipped with an Exhaust Machine Management (ESM) gas management tool with a complete three-stage dry pump included. The ESM is designed to reduce process related cross-contamination, provide excellent gas control, and reduce outgassing from the process chamber. APPLIED MATERIALS 0010-09416W reactor is capable of producing thin films for a wide range of applications, including semiconductors, photovoltaic, optoelectronic and MEMS devices. The flexibility and precision of the reactor allows for repeatability and reproducibility of the film properties crucial for microelectronic applications. The wide temperature range, adjustable showerhead, and comprehensive control asset enables the users to fine-tune and optimize their own processes, leading to higher throughput and improved yielded results.