Used AMAT / APPLIED MATERIALS 0010-09750 #293592810 for sale

AMAT / APPLIED MATERIALS 0010-09750 Reactor is a single wafer furnace for the deposition of thin films for semiconductor industrial applications. It is suitable for use in research, development, and production. This reactor uses chemical vapor deposition (CVD) and physical vapor deposition (PVD) techniques to convert gaseous precursors to solid materials. The reactor features a quartz bell jar, heated with both resistance and RF coils. The bell jar has an inside diameter of 12 inches (30 cm) and a height of 20 cm. This gives the reactor a 4.9-liter volume. A gas distributor is installed in the bottom of the Jar to ensure a uniform flow of two gases. Two stages of pumping allow the process chamber to be maintained at an appropriate pressure. A process controller allows the operator to control the temperature, gas flow, and RF power. The temperature range of AMAT 0010-09750 Reactor covers from room temperature to 1,200°C. Furthermore, the process controller is equipped with programs to make the operation simpler and more efficient. In addition, the reactor features water cooling and a pumping equipment that guarantees a tight vacuum process. The water cooling is intended to eliminate excessive local heating and keep the system temperature in a range that ensures the reliability and stability of the performance of the unit. In terms of process control, the reactor provides an adequate environment for the deposition of optics and functional materials, as well as for a wide range of other industrial procedures. Its advanced design offers accurate and repeatable control over the deposition process. This can be beneficial when creating even, high-quality layers. The high-end control machine of APPLIED MATERIALS 0010-09750 Reactor allows a range of process functions to be performed accurately and consistently. The parameters of the process can be modified if required and can also be saved for later use. As mentioned earlier, the tool has a water cooling asset that helps to prevent excessive local heating and maintain a safe temperature range. Overall, 0010-09750 Reactor is a reliable and high-performance model with good process control features. Ideal for industrial and research applications that require consistent layer deposition, this versatile reactor is a great choice for various CVD and PVD techniques.