Used AMAT / APPLIED MATERIALS 0010-09750 #293620928 for sale

AMAT / APPLIED MATERIALS 0010-09750
ID: 293620928
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AMAT / APPLIED MATERIALS 0010-09750 is a thermal reactor designed to alter the properties of materials on a molecular level. It is widely used in chemical and semiconductor processing, and operates according to the principles of high temperature and pressure. The equipment typically consists of a chamber, a vacuum pump and associated controllers, and a gas heat treatment system. During operation, a gaseous mixture is heated to temperatures above that of the melting point of the material to be processed. Pressure is also controlled and held at a pre-determined level to enable the desired processing of the material. AMAT 0010-09750 reactor can be used for a range of processes, including chemical etching, oxidation-reduction and nitridation-oxygenation. It is capable of dealing with almost any type of molecular compound or mixture, for example, metals, polymers and nano-structures. The unit is particularly well suited to silicon processing, as it is capable of operating at temperatures in excess of 1650°C. Additionally, it has the ability to support plasma coating and etching, as well as rapid heating of particles in a small volume. APPLIED MATERIALS 0010-09750 unit usages argon and nitrogen as the main inert gases, which are pumped into the processing chamber. These gases provide a carrier mode of chemical reactions in which both oxidation and reduction processes can occur (redox reactions), allowing for unprecedented levels of control over the properties of the target material. The machine is also highly energy efficient, allowing for a consistent process, with minimal change to the conditions even upon startup. This is key in ensuring consistency in the production of components, an essential part of the semiconductor industry. Overall, 0010-09750 is a highly advanced thermal reactor that is capable of performing extremely precise chemical processes with a wide range of materials. It is capable of processing at temperatures and pressures that no other reactor can manage, and is the de facto choice for the semiconductor industry.
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