Used AMAT / APPLIED MATERIALS 0010-09750 #293626250 for sale

AMAT / APPLIED MATERIALS 0010-09750 is a reactor specifically designed to grow thin films on the surface of a substrate. It consists of three main components - a process chamber, a power supply, and a loading arm - and is used for a wide variety of processes, including chemical vapor deposition (CVD) and plasma-enhanced CVD (PECVD). The process chamber is composed of an air-filled space - often referred to as a vacuum chamber - in which the substrate and the thin-film materials are heated to their desired temperatures. The power supply, which is often referred to as a furnace, is connected to the process chamber and supplies the necessary energy for growth. The loading arm, which usually extends past the process chamber, allows for substrates to be placed into the chamber. AMAT 0010-09750 features an advanced process control equipment that helps monitor, control, and optimize the deposition processes. It also features an on-board gas delivery system that supplies reactant gases and precursors to the substrate, a heated exhaust port, a vacuum unit, a variety of specialized process tooling, and a unique data acquisition machine. It also features an advanced control tool that helps in managing the deposition process and allows for faster process optimization. APPLIED MATERIALS 0010-09750 also features a number of safety features, including automatic shut-offs, contamination prevention, and interlocks to prevent contact with hot components. It also has an automated data collection asset that records process data for easy review and analysis. 0010-09750 is designed to handle a wide range of substrate sizes, film thicknesses, and process temperatures. It is usually used for high-temperature annealing and deposition of materials such as silicon, titanium, or aluminum nitride. It is designed to provide high throughput and superior process control. Overall, AMAT / APPLIED MATERIALS 0010-09750 is a highly advanced and reliable reactor that is capable of growing thin films on the surface of a substrate. Its advanced process control model ensures optimum process quality, while its variety of specialized tooling and safety features offer superior process stability and efficiency. It is ideal for those who need to grow thin films on their substrates in a quick and reliable manner.