Used AMAT / APPLIED MATERIALS 0010-09750 #9026400 for sale

AMAT / APPLIED MATERIALS 0010-09750
ID: 9026400
RF Match CVD.
AMAT / APPLIED MATERIALS 0010-09750 is a high temperature multi-zone chemical vapor deposition (CVD) reactor for producing materials for semiconductor device manufacturing. The reactor is designed with multiple chambers and heating elements, allowing for a range of temperatures and types of deposition. The chamber consists of a quartz tube situated within a re-entrant tube furnace. An array of external resistive heaters and an external insulated shielding box surrounds the quartz tube.This design allows for the heating of the tube and the deposition of a range of materials. The heating element supplies power to the quartz tube and its contents are heated to temperatures above 1000 °C. It has a temperature range of 500 - 1100 °C with 30 °C increments between points. The uniformity of the temperature within the chamber is controlled by four independently controlled heat zones, which can be adjusted to meet the requirements of various deposition processes. The design also allows for water cooling of the furnace in order to ensure that the thermal upper limit of the heating element is not exceeded. The design also allows for the introduction of oxygen and/or nitrogen as well as a range of activated gases or precursor gases. These can be injected at controlled rates via mass flow controllers to deliver a precise flow to the substrates.It also has the ability to provide a wide range of gas mixtures for different processes. The gas flow is monitored to ensure that uniformity is maintained throughout the chamber. The deposition process is controlled using a computer interface. It allows the user to accurately and precisely control the temperature, pressure and flow of gases. The reactor is also equipped with an in-situ ellipsometer and a spectroscopic ellipsometer. These tools provide the researchers with real-time feedback during process development. AMAT 0010-09750 is an ideal tool for research and development for semiconductor device fabrication. It offers precise control of the environment and allows for multiple types of deposition, making it an invaluable tool for many industries.
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