Used AMAT / APPLIED MATERIALS 0010-09750 #9358019 for sale

AMAT / APPLIED MATERIALS 0010-09750 is a process reactor that is ideal for chemical vapour deposition (CVD) and rapid thermal processing (RTP) applications. It is a large, rectangular vessel made of stainless steel, filled with inert gas, and equipped with several ports that are sealed by o-ring seals. An axially-mounted, manual rotating seal assembly is used to open and close the ports, while a convection oven is used to maintain the chamber temperature. The vessel is constructed of 304 SS and is designed with a diameter of 8" (20 cm) and height of 6.5" (17 cm), and a volume of 1000 cubic inches (16 liters). The vessel is pressure rated to 40 psig (2.75 barg). An internal rotatable implant holder is mounted axially in the center of the chamber and can support six (6) wafers up to 4" in diameter. The chamber can be fitted with up to three (3) process gas inlets, and two (2) exhausts to enable rapid, dynamic process cycling. The chamber is heated using the convection oven referenced above. This oven is constructed of 304 SS with a temperature range of 20°F-950°F (7°C-510°C). The oven is PID temperature controlled, and has a uniformity of ± 5°F (± 2°C). The heating rate is programmable up to 650°F/min (354°C/min). The chamber is also equipped with a variable speed fan, enabling convective airflow in the chamber. AMAT 0010-09750 is designed for a variety of CVD and RTP applications. With its axially mounted manual rotating seal assembly, large capacity, and convective heating, it is one of the most efficient reactors available. Its ability to rapidly cycle process gases, combined with its uniform heating, makes it ideal for high throughput and consistent results. It is capable of achieving high deposition rates with low temperatures, thus reducing cycle times. This reactor is the perfect fit for any laboratory looking for a reliable, efficient CVD or RTP system.