Used AMAT / APPLIED MATERIALS 0010-09750 #9410409 for sale

AMAT / APPLIED MATERIALS 0010-09750 reactor is an advanced materials processing tool, typically used in semiconductor manufacturing, microelectronics and optoelectronics production. By combining a high-vacuum, ionization-supported or glow-discharge active medium, gas phase chemistry and controlled heat, this machine is designed to produce, modify and develop a technological material or surface. The reactor itself is composed of an integrated hardware and software package which is designed to provide an efficient, inert and controllable environment to support a variety of materials processing techniques. The hardware consists of a central reactor chamber, a high-vacuum pumping equipment, a heated mass-flow input section, and separate output and pumping systems. A comprehensive and interactive computer control system runs the operational settings and automation of the machine. Within AMAT 0010-09750 reactor chamber, a magnetic steel enclosure is created to ensure a safe and contained environment for gas and material processing. An insulating atmosphere is maintained, allowing a range of temperatures to be set to achieve specific results. This controlled temperature is enabled by a resistance-heating element, connected to the base and driven by an alternating current power source. To accommodate process-specific materials and form a specialized environment, the high-vacuum pumping unit evacuates and pulls appropriate gases into the chamber. This is done via a turbo-molecular/ion pump/cryopump package as well as a roughing machine. The ion pump utilizes ionized gas to ensure high vacuum levels whilst the cryopump expands the range of possible gas phases. The heated mass-flow input tool allows for more reactive and corrosive materials to be introduced into the asset using gas-phase chemistry. This then evaporates and quickly incorporates the material into thin films or other solid-state constructions. The heated element improves the reaction rate of the material, with the temperature set to the level necessary for a specific process. In addition to the control and input systems, APPLIED MATERIALS 0010-09750 reactor is also designed to manage its own processes efficiently. An Automated Process Abstraction model, which is a computer-programmed PID loop, allows the sensor to measure, monitor and adjust the vacuum pressure and temperature to maintain a balanced environment. Output is also monitored via vacuum filtration systems which collect and process unwanted gas and solid material produced during the operation. Overall, 0010-09750 reactor is an optimal platform for efficient and safe materials processing. This machine is designed to be used in a variety of industries, from semi-conductor manufacturing to microelectronics and optoelectronics production. Its package of integrated hardware and software ensures that an optimal environment is maintained in order to achieve the desired results.