Used AMAT / APPLIED MATERIALS 0010-11239 #293651953 for sale

AMAT / APPLIED MATERIALS 0010-11239 is a chemical vapor deposition (CVD) reactor specifically designed for high-performance thin-film deposition. At its core is a vacuum chamber, which can operate at atmospheric pressure of up to 10-5 Torr. The chamber is made of stainless steel and features a quartz window for observation of the deposition process. Inside the chamber is a rotating platen, which supports the substrate and can be heated to temperatures up to 500°C. A combination ofRF and DC power sources can be used to generate the plasma needed for the deposition process. AMAT 0010-11239 is a modular system which can be tailored to the user's requirements. An optional gas manifold system can be added in order to introduce multiple gases into the chamber separately, allowing for a variety of deposition processes if required. The reactor is also equipped with a gas handling system, to ensure precise control of all gases used for the deposition process. APPLIED MATERIALS 0010-11239 reactor is designed to achieve maximum uniformity across the substrate, even when depositing thin layers of complex materials. Its sophisticated software allows for precise control of the deposition process, including the laser power, gas flow rates, and the substrate temperature. The entire process is monitored and recorded to ensure repeatable performance. 0010-11239 reactor is a reliable and economical choice for thin-film deposition, due to its sophisticated features and range of configurations. Its modular design makes it suitable for a variety of tasks, and its capability to handle multiple gases makes it a versatile tool for use in a wide range of research and industrial applications. Additionally, the software and hardware ensure precise control over both the process and the final quality of the deposition.