Used AMAT / APPLIED MATERIALS 0010-12516 #293651608 for sale

AMAT / APPLIED MATERIALS 0010-12516 is an ultra-high vacuum chemical vapor deposition (CVD) reactor designed for a variety of applications. It is suitable for most semiconductor and advanced material thin film deposition processes, including nanomaterials. The equipment features an improved chamber design which enables greater uniformity of the deposition process, higher process speed, and better temperature distribution over the substrate. It also includes a unique mechanical clamping mechanism which maintains a lasting contact between the base and cover parts, allowing for maximum gas flow for better equipment performance. The reactor is also equipped with a C-DSF pump system with two 65 l/s ion pumps, and a 100 l/s turbo molecular pump to provide the required fast pressure decrease and stabilization. The unit is designed with a large number of process parameters, each of which are programmable, making it highly adjustable and flexible, enabling users to tailor the output to specific requirements. It is equipped with an auto-purge feature which allows automated cleaning of the reactor between runs, and its state-of-the-art high-precision metrology can provide accurate results. In terms of safety and protection, AMAT 0010-12516 is designed with rigorous safety standards. It comes with an interlock machine which prevents any access of the process area during operation, and it also has a diagnostic tool which can monitor the safety and the performance status in real-time. Furthermore, the asset is equipped with integrated pressure and temperature sensors, as well as a model power monitor, which can be used to detect potential problems. Overall, APPLIED MATERIALS 0010-12516 is an advanced, highly reliable and efficient ultra-high vacuum chemical vapor deposition (CVD) reactor suitable for a variety of thin film deposition requirements, with a wide range of process parameters and safety features for increased user safety and performance.