Used AMAT / APPLIED MATERIALS 0010-12516 #293656972 for sale

AMAT / APPLIED MATERIALS 0010-12516 is a reactor designed for thin film deposition. It is a single-wafer prober mounted with process chamber and retractable Robot Arm module. It has an upper and lower section and allows for vertical process transport. The upper section includes a quartz process chamber with built in lift pins for wafer support, gas flow controls, HEPA filtration, in situ cleaning assemblies, and gas supply valves. The lower section comprises of a retractable Robot Arm module, which supports process wafers during the deposition process. The process chamber has a large, 256mm window that is constructed from high-alumina quartz. This window allows for visual inspection of the sample during processing. The process chamber also offers an adjustable speed roller drive that supports high- and low-particle applications. Additionally, the chamber contains a wafer lift pin and heater assembly for precise wafer handling and repeatable thermal process. The Robot Arm supports wafers from the process chamber to the sample module and back. The upper section of the Robot Arm is fitted with a sampling assembly which is custom designed for AMAT 0010-12516 reactor. This assembly helps with the accurate positioning and rotation of the wafer samples. The assembly is equipped with an integrated heater for thermal control. APPLIED MATERIALS 0010-12516 is a highly versatile reactor and can be used for diverse applications such as CVD, PECVD, RIE, ALD, APCVD, and MOCVD. With its robust design and performance features, it is an excellent choice for process optimization and significant quality improvements. Additionally, 0010-12516 is capable of handling a wide range of processes from depositing low-temperature materials to high-temperature superconductors. AMAT / APPLIED MATERIALS 0010-12516 offers great versatility with its automated sample transport process, integrated sample holder, temperature control, and adjustable heater configuration. It is also easy to use thanks to its intuitive graphic user interface. Additionally, it offers additional flexibility with its multiple gas inlets, gas purge, and exhaust. AMAT 0010-12516 can be used to achieve excellent results when used for thin-film deposition processes such as CVD and ALD.